microelectronic materials processes (14 résultats)

Etat : New. *Price HAS BEEN REDUCED by 10% until Monday, May 18 (weekend sale item)* 733 pp., hardcover, THiS IS A BRAND NEW, NEVER-OPENED BOOK!! - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.

Hardcover. Etat : Very Good. Etat de la jaquette : No Dust Jacket. Inscribed by Author. NATO ASI Series Size: Medium (20 to 26cm). Item Type: Book. Text body is clean and unmarked. Binding tight, spine fine. Inscribed by Author. ISBN: 0792301471. ISBN/EAN: 9780792301479. **Heavy Book. A Postage surcharge may be requested. Contact us BEFORE ordering for a quote. Click Ask Bookseller a Question** *** WE POST TO AUSTRALIA,UK,IRELAND,CANADA,USA,NEW ZEALAND,JAPAN & SINGAPORE ONLY ***.

Etat : Gut. Zustand: Gut | Seiten: 1000 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.

Etat : Sehr gut. Zustand: Sehr gut | Seiten: 1000 | Sprache: Englisch | Produktart: Bücher | The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Hardcover. Etat : UsedVeryGood. Hardcover; Proceedings of the NATO Advanced Study Institute on Microelectronic Materials and Processes, held in Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986. Light fading, scuffing, and shelf wear to exterior; former owner's stamping on front endpaper and copyright page; fade spots to endpapers and page edges; in very good condition with clean text, firm binding. No dust jacket.

Etat : New. In English.

Etat : New. In.

Etat : New. Brand New ! Fast Delivery "International Edition " and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 4-6 Working days .and we do have flat rate for up to 2LB. Extra shipping charges will be requested This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.

Buch. Etat : Neu. Neuware - The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Hardcover. Etat : Brand New. 10.00x6.75x2.00 inches. In Stock.

Gebunden. Etat : New. Proceedings of the NATO Advanced Study Institute, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986 The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher spe.

Kartoniert / Broschiert. Etat : New. Proceedings of the NATO Advanced Study Institute, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986 The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher spe.

Taschenbuch. Etat : Neu. Neuware - The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Paperback. Etat : Brand New. 1st edition. 985 pages. 9.20x6.40x1.80 inches. In Stock.